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Tungsten
Tungsten
W
Tungsten
Data Sheet
Physical Properties
Melting Point: 3422°C
Density: 19.254 g/cm³
Thermal Conductivity: 173 W/m·K
Electrical Resistivity: 52.8 nΩ·m at 20°
Chemical Properties
Atomic Number: 74
Atomic Weight: 183.84 amu (Atomic Mass Units)
Crystal Structure: Body-centered cubic (bcc)
Applications
Microelectronics: Used in semiconductor devices, interconnects, and bonding wires due to its excellent conductivity and thermal properties.
Optics: Applied in reflective coatings and optical devices.
Photovoltaics: Utilized in thin-film solar cells to improve efficiency and reduce manufacturing costs.
Thermal Management: Applied in electronic devices to dissipate heat efficiently.
Microelectronics: Employed in the fabrication of integrated circuits and transistors.
Protective Coatings: Provides corrosion resistance and wear protection.
Aerospace: Reflective Coatings
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Copper sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets or Wire
Copper pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Ag 11.25 As 1.43
Bi 0.5 Fe 1.18
Mn 0.33 Ni 2.46
Pb 1.02 Sb 1.08
Sn 0.8 Zn 0.02
O 1 C 1
N 1 H 1
S 5.37 Cl 0.01
P 0.21 F 0.06
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Hafnium Dioxide
Hafnium Dioxide
HfO2
Hafnium Dioxide
Data Sheet
Physical Properties
Melting Point: 2758°C
Density: 9.68 g/cm³
Chemical Properties
Chemical Formula: HfO₂
Reactivity: Quite inert, reacts with strong acids and bases
Applications
Microelectronics: HfO₂ thin films are used as high-κ dielectrics in metal-oxide-semiconductor field-effect transistors (MOSFETs). They help reduce gate leakage and improve device performance
Ferroelectric Memory: HfO₂-based thin films are utilized in ferroelectric random-access memory (FeRAM) and other non-volatile memory devices due to their ferroelectric properties
Optical Coatings: These films are used in optical coatings for lenses and mirrors, providing high refractive index and low absorption
Energy Harvesting: They are used in energy harvesting devices, such as pyroelectric and electrocaloric coolers, due to their ability to convert thermal energy into electrical energy
Forms
Evaporation Material
(any dimension)
Pellets or Starter Sources
HfO2 pellets 3mm x 6mm
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Fe 6.8 Al 5
B 0.002 Na 0.05
Si 2 P 0.01
S 0.1 Ca 0.01
Ti 0.06 Cr 0.65
Mn 0.004 Ni 0.05
Ga 0.24 Nb 0.08
In 0.02 Cu 0.044
Zn 0.005 Sc 0.2
Ta 3.2 Ir 0.02
Pt 0.04
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Germanium
Germanium
Ge
Germanium
Data Sheet
Physical Properties
Melting point: 938.25°C
Density: 5.327 g/cm³
Thermal Conductivity: 400 W/m·K
Electrical Resistivity: 1.68 µΩ·cm at 20°C
Chemical Properties
Atomic Number: 32
Atomic Weight: 72.63 u
Crystal Structure: Diamond Cubic
Applications
Electronics: Used in semiconductor devices, interconnects, and bonding wires due to its excellent conductivity and thermal properties.
Optics: Applied in reflective coatings and optical devices.
Photovoltaics: Utilized in thin-film solar cells to improve efficiency and reduce manufacturing costs.
Thermal Management: Applied in electronic devices to dissipate heat efficiently.
Microelectronics: Employed in the fabrication of integrated circuits and transistors.
Protective Coatings: Provides corrosion resistance and wear protection.
Aerospace: Reflective Coatings
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Germanium sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets or Starter Sources
Germanium Cubes .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Al 0.03 Ca 0.03
Cu 0.01 Fe 0.05
Mg 0.3 Na 0.2
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Titanium
Titanium
Ti
Titanium
Data Sheet
Physical Properties
Melting point: 1668°C
Density: 4.506 g/cm³
Thermal Conductivity: 21.9 W/m·K
Electrical Resistivity: 42.7 µΩ·cm at 20°C
Chemical Properties
Atomic Number: 22
Atomic Weight: 47.87 amu
Crystal Structure: Hexagonal Close Packed Cubic (HCP)
Applications
Electronics: Employed in thin-film resistors, capacitors, and other electronic components.
Optics: Applied in reflective coatings and optical devices.
Thin-Film Transistors (TFTs): Employed in display technologies such as LCDs and OLEDs for improved efficiency and durability.
Medical: Utilized in medical implants and devices due to its biocompatibility and non-toxic nature.
Protective Coatings: Used in packaging to provide a barrier against moisture, oxygen, and other environmental factors
Wear Resistance: Enhances the durability of surfaces exposed to mechanical wear and abrasion.
Aerospace: Reflective Coatings
Energy: Photovoltaics & Fuel Cells
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Titanium sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets, Starter Sources or Wire
Titanium pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Al 0.38 Ca <0.2
Cr 0.33 Cu 0.26
Fe 3.7 Li <0.005
Mg <0.05 Mo <0.05
K ND Si 0.36
N 26 O 210
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Tantalum
Tantalum
Ta
Tantalum
Data Sheet
Physical Properties
Melting point: 3017°C
Density: 16.678 g/cm³
Thermal Conductivity: 57.5 W/m·K
Electrical Resistivity: 131µΩ·cm at 20°C
Chemical Properties
Atomic Number: 73
Atomic Weight: 180.94 amu
Crystal Structure: Body Centered Cubic (FCC)
Applications
Electronics: Diffusion barriers between copper interconnects and silicon. Capacitor electrodes in microelectronics. Gate electrodes in metal-oxide-semiconductor devices.
Optics: Anti-reflective coatings, optical filters and heat reflecting filters.
Medical: Utilized in medical implants and devices due to its biocompatibility
Protective Coatings: Wear-resistant coatings for cutting tools and mechanical components.
Wear Resistance: Enhances the durability of surfaces exposed to mechanical wear and abrasion.
Aerospace: Thermal barriers, oxidation-resistant layers, protective coatings for turbine components.
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Tantalum sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets, Starter Sources or Wire
Tantalum pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of a Typical Certificate of Analysis
Element PPM Level Element PPM Level
Cr 3 Cu 5
Fe 10 Mn 1
Mo 1.5 Nb 17
Ni 6 Si 4
Ti 0.5 W 6
Zr 1 O 83
C 6 N 58
H 2
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Nickel
Nickel
Ni
Nickel
Data Sheet
Physical Properties
Melting point: 1455°C
Density: 8.90 g/cm³
Thermal Conductivity: 90.7 W/m·K
Electrical Resistivity: 6.84 µΩ·cm at 20°C
Chemical Properties
Atomic Number: 28
Atomic Weight: 58.69 amu
Crystal Structure: Face-Centered Cubic (FCC)
Applications
Electronics: Nickel thin films are used as electrical contacts and barriers in semiconductor devices due to their good electrical conductivity and resistance oxidation
Magnetic Storage: Nickel’s ferromagnetic properties make it ideal for use in magnetic storage technologies, such as hard drives and magnetic tapes
Electrodes: Nickel thin films are used as electrodes in certain battery technologies, such as nickel-cadmium and nickel-metal hydride batteries, due to their good electrical conductivity and stability
Optics: Nickel thin films are used in optical applications for reflective coatings, enhancing the performance of mirrors and other optical devices
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Nickel sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets, Starter Sources or Wire
Nickel pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Cr 0.01 Co 5.1
Cu 5.5 Fe 1.1
Mg 0.005 Mn <0.005
Si 0.03 Ti 0.24
V <0.005 Zr <0.005
N 10 O 30
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Copper
Copper
Cu
Copper
Data Sheet
Physical Properties
Melting point: 1083°C
Density: 8.92 g/cm³
Thermal Conductivity: 400 W/m·K
Electrical Resistivity: 1.68 µΩ·cm at 20°C
Chemical Properties
Atomic Number: 29
Atomic Weight: 63.55 amu
Crystal Structure: Face-Centered Cubic (FCC)
Applications
Electronics: Used in semiconductor devices, interconnects, and bonding wires due to its excellent conductivity and thermal properties.
Optics: Applied in reflective coatings and optical devices.
Photovoltaics: Utilized in thin-film solar cells to improve efficiency and reduce manufacturing costs.
Thermal Management: Applied in electronic devices to dissipate heat efficiently.
Microelectronics: Employed in the fabrication of integrated circuits and transistors.
Protective Coatings: Provides corrosion resistance and wear protection.
Aerospace: Reflective Coatings
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Copper sputtering target for 200mm PVD system
Evaporation Material
(any dimension)
Pellets, Starter Sources or Wire
Copper pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Ag 11.25 As 1.43
Bi 0.5 Fe 1.18
Mn 0.33 Ni 2.46
Pb 1.02 Sb 1.08
Sn 0.8 Zn 0.02
O 1 C 1
N 1 H 1
S 5.37 Cl 0.01
P 0.21 F 0.06
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Aluminium
Aluminium
Al
Aluminum
Data Sheet
Physical Properties
Melting point: 660.3°C
Density: 2.70g/cm³
Thermal Conductivity: 235 W/m·K
Electrical Resistivity: 2.65 µΩ·cm at 20°C
Chemical Properties
Atomic Number: 13
Atomic Weight: 26.98 amu
Crystal Structure: Face-Centered Cubic (FCC)
Applications
Electronics: Microelectronics for interconnects, bonding wires, and thin film capacitors
Optics: Applied in reflective coatings and optical devices for its high reflectivity.
Protective Coatings: Used in packaging to provide a barrier against moisture, oxygen, and other environmental factors
Aerospace: Reflective Coatings
Energy: Photovoltaics & Fuel Cells
Forms
Sputtering Targets
(any dimension)
Diameter, Rectangular, Delta & Rotatable configurations
Al Enhanced sputtering target for 300mm PVD system
Evaporation Material
(any dimension)
Pellets, Starter Sources or Wire
Al pellets .250” x .250”
Purity Guide
Purity   Level Metallic Impurities Allowed (PPM)
(2N) 99% 99% 10,000
(2N5) 99.5% 5,000
(3N) 99.9% 1,000
(3N5) 99.95% 500
(4N) 99.99% 100
(4N5) 99.995% 50
(5N) 99.999% 10
(5N5) 99.9995%   5
(6N) 99.9999%   1
Example of an Actual Certificate of Analysis
Element PPM Level Element PPM Level
Ag <0.01 Cu 0.17
Si 0.47 Fe 0.16
Ti 0.03 Mn 0.02
Mg 0.17 Zn 0.01
Ni 0.01 Cr 0.02
Na 0.01 U <0.1
Th <0.1
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Purity	Level	Metallic Impurities Allowed (PPM)
(2N) 99%	99%	10,000
(2N5)	99.5%	5,000
(3N)	99.9%	1,000
(3N5)	99.95%	500
(4N)	99.99%	100
(4N5)	99.995%	50
(5N)	99.999%	10
(5N5)	99.9995%	5
(6N)	99.9999%	1

Element	PPM Level	Element	PPM Level
Ag	11.25	As	1.43
Bi	0.5	Fe	1.18
Mn	0.33	Ni	2.46
Pb	1.02	Sb	1.08
Sn	0.8	Zn	0.02
O	1	C	1
N	1	H	1
S	5.37	Cl	0.01
P	0.21	F	0.06

Element	PPM Level	Element	PPM Level
Fe	6.8	Al	5
B	0.002	Na	0.05
Si	2	P	0.01
S	0.1	Ca	0.01
Ti	0.06	Cr	0.65
Mn	0.004	Ni	0.05
Ga	0.24	Nb	0.08
In	0.02	Cu	0.044
Zn	0.005	Sc	0.2
Ta	3.2	Ir	0.02
Pt	0.04

Element	PPM Level	Element	PPM Level
Al	0.38	Ca	<0.2
Cr	0.33	Cu	0.26
Fe	3.7	Li	<0.005
Mg	<0.05	Mo	<0.05
K	ND	Si	0.36
N	26	O	210

Element	PPM Level	Element	PPM Level
Cr	0.01	Co	5.1
Cu	5.5	Fe	1.1
Mg	0.005	Mn	<0.005
Si	0.03	Ti	0.24
V	<0.005	Zr	<0.005
N	10	O	30

News

Tungsten

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Hafnium Dioxide

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Germanium

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Titanium

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Tantalum

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of a Typical Certificate of Analysis

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Nickel

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Copper

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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Aluminium

Data Sheet

Physical Properties

Chemical Properties

Applications

Forms

Purity Guide

Example of an Actual Certificate of Analysis

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